Wooptix 在 CEA-Leti 安装首套 Phemet® 计量系统

Wooptix Installs First Phemet® Metrology System at CEA-Leti

CEA-Leti Original
摘要
Wooptix在法国CEA-Leti研究所首次安装其Phemet®生产计量系统,建立长期合作,共同开展晶圆级工艺表征和先进封装计量研发。该系统提供亚纳米级超快晶圆几何测量,助力Wooptix在尖端环境中优化技术,并满足高量产制造对更小、更复杂器件的精度需求。

2026年6月29日,法国格勒诺布尔与西班牙特内里费——半导体波前相位成像计量创新企业Wooptix宣布,旗下首台Phemet®生产计量系统已于2026年5月4日在CEA-Leti格勒诺布尔技术研究所完成安装。这既是该产品首次投入生产部署,也标志着公司正式切入半导体计量与工艺控制主战场。

此次部署激活了双方长期合作:依托CEA-Leti的工业级洁净室和先进研发生态,联合工作将集中在晶圆级工艺特征提取、纳米形貌表征以及先进封装计量等方向,直接对接近实际产品的制程。合作细节在6月23日至25日举办的CEA-Leti年度旗舰活动——创新日暨LID世界峰会上被重点展示。

Wooptix于2025年11月发布Phemet®系统,其核心技术优势在于以亚纳米级分辨率实现超快速、超高精度的晶圆形状与几何参数测量。该工具精准回应了高量产制造中的严苛挑战:随着器件尺寸不断微缩、结构复杂度提升且集成方式革新,业界对工艺控制能力的需求急剧增加,Phemet®因而能够为前沿半导体制造提供关键计量支撑。

通过与欧洲顶级研发机构的深度绑定,Wooptix得以在实际产品流程中测试并打磨自身技术,同时探索更广泛的应用场景,为后续规模化拓展铺路。

Summary
Wooptix has installed its first Phemet® production metrology system at CEA-Leti in Grenoble, establishing a long-term collaboration to advance semiconductor process control. The tool delivers sub-nanometer wafer shape and geometry measurements, targeting high-volume manufacturing of next-generation, nanoscale devices. The deployment enables Wooptix to test and refine its technology within one of Europe’s top semiconductor R&D environments, directly supporting advanced-packaging and nanotopography metrology.

Wooptix has installed its first Phemet® production metrology system at CEA-Leti’s Grenoble research institute, marking a pivotal step in the company’s push into semiconductor process control. Deployed on May 4, 2026, the tool will support collaborative work on wafer-scale process signatures, nanotopography, and advanced-packaging metrology within an industrial cleanroom environment. The partnership was showcased during CEA-Leti’s Innovation Days/LID World Summit on June 23–25.

Introduced in November 2025, Phemet® provides ultrafast, sub-nanometer-resolution measurements of wafer shape and geometry. It is designed to meet escalating demands for tighter process control in high-volume manufacturing of devices with ever-smaller, nanoscale features and novel integration schemes. By embedding the system in one of Europe’s leading R&D ecosystems, Wooptix gains a direct route to test and refine its technology on product-relevant processes while uncovering new use cases.

Résumé
Wooptix a installé son premier système de métrologie Phemet® en production au sein de l'institut de recherche CEA-Leti à Grenoble, marquant une collaboration à long terme avec un écosystème de R&D majeur. Cet outil fournit des mesures ultrarapides et ultraprécises de la géométrie des wafers, répondant aux exigences du contrôle de procédés dans la fabrication de semi-conducteurs avancés. Ce déploiement permet à Wooptix d’affiner sa technologie en conditions industrielles réelles et d’explorer de nouveaux cas d’usage.

​​​​​​Represents Wooptix's first production deployment and establishes long-term collaboration with one of the World's leading semiconductor R&D ecosystems

GRENOBLE, France and TENERIFE, Spain, June 29, 2026—Wooptix, an innovation leader in semiconductor wavefront phase imaging metrology, today announced the installation of its Phemet® system at CEA-Leti's Grenoble technology research institute, marking a significant milestone in the company's expansion into semiconductor metrology and process control. Installed on May 4, 2026, the system will support joint work on wafer-scale process signatures, nanotopography, and advanced-packaging metrology in an industrial semiconductor cleanroom environment. The joint agreement was highlighted duringCEA-Leti Innovation Days/LID World Summit, the institute's flagship annual event that took place in June 23-25 in Grenoble.

The installation is the first deployment of Wooptix's Phemet® production metrology tool. The collaboration will enable Wooptix to test and refine its technology directly on and product-relevant processes while exploring new use cases within one of Europe's most sophisticated R&D facilities.

Wooptix introduced its Phemet® metrology system in November 2025. It provides ultrafast and extremely accurate wafer shape and geometry measurements with sub-nanometer resolution. Phemet® addresses the growing demand for improved process control in high-volume manufacturing, especially as the industry continues to innovate with higher-performance, smaller and more complex devices with nanoscale feature sizes and novel integration approaches.

AI Insight
Core Point

Wooptix deployed its first production wafer metrology tool at CEA-Leti, validating its technology in a top R&D environment and opening a path to high-volume manufacturing process control.

Key Players
  • Wooptix — semiconductor wavefront phase imaging metrology company; based in Tenerife, Spain and Grenoble, France.
  • CEA-Leti — leading semiconductor R&D institute; based in Grenoble, France.
Industry Impact
  • ICT: High — sub-nanometer metrology is critical for advanced semiconductor manufacturing yields.
Tracking

Monitor — first installation at a premier institute marks early commercial traction; success could drive broader adoption but remains unproven in production.

Highlights
Investment / Funding Upcoming Event
Related Companies
CEA-Leti
CEA-Leti mature
positive
Wooptix
startup
positive
Categories
半导体 科研
AI Processing
2026-06-29 16:18
deepseek / deepseek-v4-pro