Soitec与ZenSemi携手合作,共同开发300毫米晶圆上的BCD-on-SOI技术。

Soitec et ZenSemi s’allient sur le BCD-sur-SOI en tranches de 300 mm

VIPress.net by Pascal Coutance 2026-06-30 13:51 Original
摘要
法国Soitec与中国代工厂ZenSemi宣布合作,共同推进300毫米晶圆BCD-on-SOI衬底技术的产业化。该平台旨在满足AI数据中心、电动汽车、机器人及工业领域日益增长的功率电子需求。

法国Soitec与中国代工厂ZenSemi宣布达成合作,双方将整合各自在绝缘体上硅(SOI)衬底与BCD(Bipolar-CMOS-DMOS)工艺领域的专长,共同推动300毫米晶圆的BCD-on-SOI技术走向量产。该合作平台旨在应对人工智能数据中心、电动汽车、机器人及工业应用对功率电子日益增长的需求。

Soitec总部位于法国格勒诺布尔,是工程衬底领域的领先供应商,尤其以SOI晶圆技术见长。ZenSemi则是一家专注于功率半导体制造的中国代工企业。通过合作,Soitec提供高性能SOI衬底,ZenSemi将其BCD工艺移植到300毫米大尺寸晶圆上,从而实现器件的高压集成、低功耗和高可靠性。BCD-on-SOI技术结合了双极型器件的模拟精度、CMOS的逻辑密度以及DMOS的功率处理能力,利用SOI的埋氧层实现完全介质隔离,可显著减少寄生效应并提升开关速度。

这一平台直接瞄准了高速扩张的功率半导体市场:AI数据中心需要更高效的电源管理芯片来降低能耗;电动汽车对车载充电、逆变器和电池管理系统的需求激增;机器人和工业自动化则依赖紧凑、耐高温的功率模块。通过升级到300毫米晶圆,单晶圆芯片产出量将大幅提升,有助于缓解全球功率芯片供应紧张,并降低单位成本。双方未透露具体投资规模或量产时间表,但此举标志着Soitec将其高端衬底技术向中国市场延伸,而ZenSemi则借此跻身主流功率代工前列,强化其在智能功率IC制造领域的竞争力。

Summary
Soitec and Chinese foundry ZenSemi have partnered to industrialize BCD-on-SOI substrate technology on 300 mm wafers, targeting power electronics demand in AI data centers, electric vehicles, robotics, and industry. This collaboration combines Soitec's engineered substrate expertise with ZenSemi's specialized manufacturing to scale production of energy-efficient chips. The move addresses the growing need for advanced power management in high-growth sectors, potentially reducing costs through larger wafer formats.

Soitec, the French semiconductor materials specialist based in Grenoble, and ZenSemi, a Chinese foundry dedicated to specialized processes, are joining forces to bring BCD-on-SOI (Bipolar-CMOS-DMOS on Silicon-On-Insulator) technology to 300 mm wafers. The partnership targets the rapidly expanding power electronics requirements of AI data centers, electric vehicles, robotics, and industrial systems.

By combining Soitec’s engineered substrate leadership—notably its Smart Cut SOI wafers—with ZenSemi’s high-voltage BCD manufacturing expertise, the two companies aim to industrialize a platform that delivers superior integration, efficiency, and thermal performance at scale. Moving BCD-on-SOI from the current 200 mm standard to 300 mm promises significant cost reductions per die, higher throughput, and the ability to address complex power management and analog functions needed in advanced nodes.

The collaboration is a direct response to surging demand for high-efficiency power chips capable of handling higher voltages and currents while reducing energy losses. In AI data centers, for instance, power delivery and voltage regulation are critical bottlenecks; BCD-on-SOI enables monolithic integration of intelligent power stages. Similarly, electric vehicle traction inverters and on-board chargers benefit from the technology’s robustness and integration density. The platform is also well-suited for industrial motor drives and collaborative robots, where compact, efficient power electronics are paramount.

Soitec’s SOI substrates provide inherent dielectric isolation, which allows BCD circuits to operate at higher temperatures and with reduced parasitic effects compared to bulk silicon. ZenSemi’s process design kit and manufacturing lines are being tuned to leverage these advantages in high-volume 300 mm production, a move that aligns with the industry’s transition to larger wafers for power and analog semiconductors.

The announcement builds on Soitec’s ongoing expansion in power electronics, including recent investments in SOI wafer capacity and its push into compound semiconductors. For ZenSemi, the partnership reinforces its position as a niche foundry capable of delivering differentiated process technologies to global customers. No timeline or financial details were disclosed, but the companies emphasized that joint development work is underway with early access for key customers expected in the near term.

Résumé
Soitec et le fondeur chinois ZenSemi s’associent pour industrialiser une technologie de substrats BCD-sur-SOI en tranches de 300 mm. Cette plateforme répond à la demande croissante en électronique de puissance pour les centres de données d’IA, les véhicules électriques, la robotique et l’industrie.

Le Grenoblois et la fonderie chinoise spécialisée unissent leurs expertises pour industrialiser une technologie de substrats BCD-sur-SOI en tranches de 300 mm. Cette plateforme vise les besoins croissants en électronique de puissance des centres de données d’IA, des véhicules électriques, de la robotique et de l’industrie. Soitec et le fondeur chinois ZenSemi annoncent un partenariat […]

Cet article Soitec et ZenSemi s’allient sur le BCD-sur-SOI en tranches de 300 mm a été publié par VIPress.net.

AI Insight
Core Point

Soitec and ZenSemi are partnering to industrialize BCD-on-SOI substrates on 300mm wafers, addressing surging power semiconductor demand from AI, EVs, and robotics.

Key Players
  • Soitec — French engineered substrate leader (SOI wafers), based in Grenoble, France.
  • ZenSemi — Chinese specialty foundry focused on power semiconductors, located in China.
Industry Impact
  • ICT: High — data center power management driven by AI demands.
  • Automotive: High — electric vehicle power electronics require efficient chips.
  • Energy: High — industrial and robotics applications need advanced power efficiency.
  • Computing/AI: High — AI server power delivery directly benefits.
Tracking

Strongly track — partnership combines European substrate IP with Chinese high-volume production for critical power technologies across multiple booming sectors.

Highlights
Investment / Funding
Related Companies
Soitec
CEA-Leti mature
positive
neutral
positive
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半导体 创业
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2026-06-30 16:03
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