Communiqué de presse|Actualité|Nouvelles technologies
New Multi-Year Agreement Will Focus on Accelerating Pathfinding of New Materials andProcesses for the Manufacturing of More Energy-Efficient Specialty Devices
FREMONT, Calif., and GRENOBLE, France, February 2, 2026–Lam Research Corp.(Nasdaq: LRCX), a leader in semiconductor fabrication equipment and services andCEA-Leti, a research institute pioneering micro- and nanotechnologies, today announced a new multi-year agreement to advance the development of next-generation Specialty Technology devices, including micro-electromechanical systems (MEMS), 3D imaging and sensors, power management and radio frequency (RF) solutions, photonics (including MicroLED display applications), and optical interconnect technologies.
Under the agreement, Lam and CEA-Leti will explore novel multi-elemental materials and pathfinding for future fabrication processes of higher-efficiency compound semiconductors. By working with CEA-Leti, Lam strives to more quickly identify and overcome critical materials and engineering challenges, and accelerate the optimization of new fabrication solutions for future generations of Specialty Technology devices for AI and high-performance computing.
Building on a long history of successful co-development projects, including recent work on pulsed plasma technologies, the new joint research with CEA-Leti will focus on exploring a range of new, novel materials and films for lower-power, high-performance specialty technology applications and devices. These are intended solutions for next-generation RF filters, electro-optic modulation, and quantum optics.
Lam's innovative etch and deposition technologies, including the company's breakthrough pulsed laser deposition (PLD) system,Lam Prestis™, will be integral to the research. By accessing CEA-Leti's extensive materials analysis, surface science, and device characterization and measurement capabilities, Lam aspires to better understand the impact of process developments on materials properties and device performance.