Wooptix installe le premier système de métrologie Phemet® au CEA-Leti
Wooptix在法国格勒诺布尔的CEA-Leti研究所完成了其首套Phemet®生产计量系统的安装，这标志着公司从波前相位成像技术向半导体计量与过程控制领域扩张的关键一步。Phemet®于2025年11月发布，是一套超快、亚纳米级精度的晶圆形状与几何参数测量工具，专为应对高量产环境中对更小、更高性能、纳米尺度特征尺寸及新型集成工艺的严格过程控制需求而设计。
该系统于2026年5月4日正式在Leti的工业级洁净室中投入使用，双方将围绕晶圆级工艺特征、纳米形貌和先进封装计量开展联合研究。此次合作在6月23日至25日举办的CEA-Leti创新日暨LID世界峰会上被作为重点宣布，该活动是该研究所的年度旗舰会议。对Wooptix而言，这不仅是Phemet®的首次生产部署，更使其得以在欧洲最先进的半导体研发生态中，直接基于产品级工艺进行技术验证、改进，并拓展新的应用场景。
Wooptix has installed its first Phemet® production metrology system at CEA-Leti’s Grenoble research institute, marking the company’s initial production deployment and a long-term collaboration within a premier semiconductor R&D ecosystem. The system, put in place on May 4, 2026, will support joint work on wafer-scale process signatures, nanotopography, and advanced-packaging metrology in a full-scale cleanroom, a partnership underscored during the CEA-Leti Innovation Days / LID World Summit (June 23–25).
Phemet®, introduced in November 2025, delivers ultrafast, sub-nanometer-resolution measurements of wafer shape and geometry, directly addressing the demand for tighter process control in high-volume manufacturing as devices shrink and integration schemes become more complex. For Wooptix, the collaboration offers a pathway to validate and fine-tune its technology on industry-relevant processes and expand into new use cases, while reinforcing its foothold in semiconductor metrology alongside a world-class R&D institute.
Communiqué de presse|Actualité|Nouvelles technologies
Represents Wooptix's first production deployment and establishes long-term collaboration with one of the World's leading semiconductor R&D ecosystems
GRENOBLE, France and TENERIFE, Spain, June 29, 2026—Wooptix, an innovation leader in semiconductor wavefront phase imaging metrology, today announced the installation of its Phemet® system at CEA-Leti's Grenoble technology research institute, marking a significant milestone in the company's expansion into semiconductor metrology and process control. Installed on May 4, 2026, the system will support joint work on wafer-scale process signatures, nanotopography, and advanced-packaging metrology in an industrial semiconductor cleanroom environment. The joint agreement was highlighted duringCEA-Leti Innovation Days/LID World Summit, the institute's flagship annual event that took place in June 23-25 in Grenoble.
The installation is the first deployment of Wooptix's Phemet® production metrology tool. The collaboration will enable Wooptix to test and refine its technology directly on and product-relevant processes while exploring new use cases within one of Europe's most sophisticated R&D facilities.
Wooptix introduced its Phemet® metrology system in November 2025. It provides ultrafast and extremely accurate wafer shape and geometry measurements with sub-nanometer resolution. Phemet® addresses the growing demand for improved process control in high-volume manufacturing, especially as the industry continues to innovate with higher-performance, smaller and more complex devices with nanoscale feature sizes and novel integration approaches.
Wooptix installed its first production metrology tool at CEA-Leti, validating its sub-nanometer wafer measurement technology in a top semiconductor R&D environment.
Strongly track — first deployment and partnership with a premier R&D hub could accelerate market validation and adoption of Wooptix’s Phemet®.