Communiqué de presse|Actualité|Nouvelles technologies
Represents Wooptix's first production deployment and establishes long-term collaboration with one of the World's leading semiconductor R&D ecosystems
GRENOBLE, France and TENERIFE, Spain, June 29, 2026—Wooptix, an innovation leader in semiconductor wavefront phase imaging metrology, today announced the installation of its Phemet® system at CEA-Leti's Grenoble technology research institute, marking a significant milestone in the company's expansion into semiconductor metrology and process control. Installed on May 4, 2026, the system will support joint work on wafer-scale process signatures, nanotopography, and advanced-packaging metrology in an industrial semiconductor cleanroom environment. The joint agreement was highlighted duringCEA-Leti Innovation Days/LID World Summit, the institute's flagship annual event that took place in June 23-25 in Grenoble.
The installation is the first deployment of Wooptix's Phemet® production metrology tool. The collaboration will enable Wooptix to test and refine its technology directly on and product-relevant processes while exploring new use cases within one of Europe's most sophisticated R&D facilities.
Wooptix introduced its Phemet® metrology system in November 2025. It provides ultrafast and extremely accurate wafer shape and geometry measurements with sub-nanometer resolution. Phemet® addresses the growing demand for improved process control in high-volume manufacturing, especially as the industry continues to innovate with higher-performance, smaller and more complex devices with nanoscale feature sizes and novel integration approaches.